Advanced Oxide Etch Tool
University of Central Florida - Purchasing
University of Central Florida is seeking an advanced oxide etch tool for etching fused silica wafers to create high optical quality elements.
Reference No.
RFP-2025-3128
Category
Research/Development
Due Date
August 28th, 2025
Description
The University of Central Florida is soliciting bids for an advanced oxide etch tool for Inductively Coupled Plasma etching of fused silica wafers. Specifically, for the transfer etching of analog photoresist profiles into fused silica substrates without damage for high optical quality elements at the wafer scale. The required specifications are located on the Bid Sheet (pages 13-14)
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RFP Submission Requirements for UCF Oxide Etch Tool
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